The role of hydrogen in the growth of Ge on a Si(001)-(2 X I) surface
was studied by scanning tunneling microscopy and medium energy ion sca
ttering spectroscopy. The adsorbed hydrogen was found to (i) increase
the number of equilibrium adsorption sites, (ii) lift the diffusion an
isotropy, and (iii) lower the diffusivity for Ge adatom, as suggested
by the recent first principle calculation. With a dynamically supplied
atomic hydrogen flux of similar to 2 monolayers/s, we achieved layer-
by-layer growth by preventing growth of the hut cluster beyond the kno
wn critical thickness. The 10.0 monolayer Ge layers grown with hydroge
n surfactant are strained, while those without it are relaxed.