ELECTRON-ATTACHMENT TO NO IN SUPERCRITICAL ETHANE

Citation
M. Nishikawa et al., ELECTRON-ATTACHMENT TO NO IN SUPERCRITICAL ETHANE, JOURNAL OF PHYSICAL CHEMISTRY B, 102(21), 1998, pp. 4189-4192
Citations number
24
Categorie Soggetti
Chemistry Physical
Journal title
JOURNAL OF PHYSICAL CHEMISTRY B
ISSN journal
15206106 → ACNP
Volume
102
Issue
21
Year of publication
1998
Pages
4189 - 4192
Database
ISI
SICI code
1089-5647(1998)102:21<4189:ETNISE>2.0.ZU;2-2
Abstract
Electron attachment to NO was studied in supercritical ethane at 33, 3 7, and 47 degrees C as a function of pressure (35-110 bar). The rate c onstant for electron attachment increases with increasing pressure at all temperatures studied. The most dramatic increases are observed nea r the critical pressure. The activation volume for this reaction is ne gative and quite large in magnitude, especially in this region. The ac tivation volume depends on the isothermal compressibility. The results are compared to volume changes predicted by a compressible continuum model.