Jw. Garland et al., Evidence that arsenic is incorporated as As-4 molecules in the molecular beam epitaxial growth of Hg1-xCdxTe : As, APPL PHYS L, 74(14), 1999, pp. 1975-1977
Molecular arsenic, As-4, is commonly used as the source for in situ p-type
doping of Hg1-xCdxTe grown by molecular beam epitaxy. As incorporated, the
arsenic is strongly self-compensated, requiring annealing for its p-type el
ectrical activation. Here, a quasithermodynamic model is used to interpret
the dependence of the arsenic concentration, c (As), as measured by seconda
ry ion mass spectroscopy, on the incident As-4 and Hg fluxes during growth.
The results strongly suggest that the As-4 is absorbed in its molecular fo
rm rather than being dissociated on the growth surface, as has previously b
een assumed. This clearly is relevant to the self-compensation of the arsen
ic in as-grown Hg1-xCdxTe. (C) 1999 American Institute of Physics. [S0003-6
951(99)01314-5].