Light-induced mobility enhancement in delta-doped GaAs/In0.26Ga0.74As/GaAsquantum wells grown by molecular beam epitaxy on GaAs(001)

Citation
M. Zervos et al., Light-induced mobility enhancement in delta-doped GaAs/In0.26Ga0.74As/GaAsquantum wells grown by molecular beam epitaxy on GaAs(001), APPL PHYS L, 74(14), 1999, pp. 2026-2028
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
14
Year of publication
1999
Pages
2026 - 2028
Database
ISI
SICI code
0003-6951(19990405)74:14<2026:LMEIDG>2.0.ZU;2-I
Abstract
We have studied persistent photoconductivity in 80 Angstrom strained GaAs/I n0.26Ga0.74As/GaAs quantum wells grown by molecular beam epitaxy at 480 deg rees C by measuring the Shubnikov de Haas and Hall effects at 4.2 K. Each q uantum well was delta doped with Si to 2 X 10(12) cm(-2) either (i) at the center of the quantum well, (ii) at the lower interface, or (iii) the botto m barrier. The free-carrier density after exposure to 654 nm red light with above-band-gap energy did not exceed significantly the intended delta-dopi ng level, but the Hall mobility increased dramatically and was accompanied by stronger Shubnikov de Haas oscillations. We attribute this to electron-h ole pair generation and separation and/or the photoionization of deep state s, which create a positive space charge in the surface depletion region. Th is leads to electrostatic bandbending, which converts the quantum well from being asymmetric in the dark to square-like after illumination and shifts the charge distribution away from the delta layer, improving the mobility. This hypothesis is corroborated by the light insensitivity of both an ident ical heterostructure delta doped to 2 X 10(12) cm(-2) in the top barrier an d an equivalent set of heterostructures delta doped with Si to 4.5 X 10(12) cm(-2). (C) 1999 American Institute of Physics. [S0003-6951(99)03814-0].