Charge trap dynamics in a SiO2 layer on Si by scanning capacitance microscopy

Citation
Cj. Kang et al., Charge trap dynamics in a SiO2 layer on Si by scanning capacitance microscopy, APPL PHYS L, 74(13), 1999, pp. 1815-1817
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
13
Year of publication
1999
Pages
1815 - 1817
Database
ISI
SICI code
0003-6951(19990329)74:13<1815:CTDIAS>2.0.ZU;2-2
Abstract
Trapped electrons and holes, and their dynamics, were visualized from spati ally resolved capacitance-voltage (C-V) curves and dC/dV images using scann ing capacitance microscopy. A trapped charge of 10(-16) -10(-18) C, localiz ed within 2 mu m diam circular test structures, was imaged. The detrapping process of the trapped electrons can be explained with a quantum-mechanical tunneling model. (C) 1999 American Institute of Physics. [S0003-6951(99)01 513-2].