Electron beam lithography and ion milling have been used to pattern sputter
ed Cu/Co multilayer wires ranging in width from 750 to 35 nm. Samples havin
g Cu thicknesses which correspond to the first, second, and third antiferro
magnetic coupling maxima have been measured. Contrary to expectation, enhan
cement in the amplitude of the giant magnetoresistance with decreasing widt
h was not observed. (C) 1999 American Institute of Physics.