Width dependence of giant magnetoresistance in Cu/Co multilayer nanowires

Electron beam lithography and ion milling have been used to pattern sputter ed Cu/Co multilayer wires ranging in width from 750 to 35 nm. Samples havin g Cu thicknesses which correspond to the first, second, and third antiferro magnetic coupling maxima have been measured. Contrary to expectation, enhan cement in the amplitude of the giant magnetoresistance with decreasing widt h was not observed. (C) 1999 American Institute of Physics.