Magnetic and hardness properties of nanostructured Ni-Co films deposited by a nonaqueous electroless method

Citation
Gm. Chow et al., Magnetic and hardness properties of nanostructured Ni-Co films deposited by a nonaqueous electroless method, APPL PHYS L, 74(13), 1999, pp. 1889-1891
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
13
Year of publication
1999
Pages
1889 - 1891
Database
ISI
SICI code
0003-6951(19990329)74:13<1889:MAHPON>2.0.ZU;2-0
Abstract
Nanostructured NixCo100-x films were deposited on Cu substrates by reducing the constituent metal salts in refluxing ethylene glycol at 194 degrees C. The average crystallite size increased with x, and reached a maximum of 64 nm when x = 100. The coercivity H (c) of the films measured in the directi on perpendicular (perpendicular to) to the plane of the film was higher tha n that in the parallel (parallel to) direction. For the sample of x = 50, H (c perpendicular to) was 379 Oe, which was six times that of H (c parallel to.) Saturation magnetization M (s) in the film plane was 1016 emu/cm(3), and the remanent magnetization M (r) 636 emu/cm(3), giving a squareness rat io of 0.63. This film also had a Vickers hardness of 193. (C) 1999 American Institute of Physics.