Application of neural networks to the modeling of LPCVD reactors - Deposition of in-situ boron-doped silicon

Authors
Fakhr-Eddine, K Cabassud, M Lann, MV Couderc, JP
Citation
K. Fakhr-eddine et al., Application of neural networks to the modeling of LPCVD reactors - Deposition of in-situ boron-doped silicon, CHEM ENGN J, 72(2), 1999, pp. 171-182
Citations number
19
Categorie Soggetti
Chemical Engineering
Journal title
CHEMICAL ENGINEERING JOURNAL
ISSN journal
13858947 → ACNP
Volume
72
Issue
2
Year of publication
1999
Pages
171 - 182
Database
ISI
SICI code
1385-8947(19990208)72:2<171:AONNTT>2.0.ZU;2-T