Growth rate effects during indium-antimony crystal growth

Citation
Ta. Campbell et Jn. Koster, Growth rate effects during indium-antimony crystal growth, CRYST RES T, 34(3), 1999, pp. 275-283
Citations number
18
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CRYSTAL RESEARCH AND TECHNOLOGY
ISSN journal
02321300 → ACNP
Volume
34
Issue
3
Year of publication
1999
Pages
275 - 283
Database
ISI
SICI code
0232-1300(1999)34:3<275:GREDIC>2.0.ZU;2-S
Abstract
Local interface velocities are tracked radioscopically in the III-V semicon ductor compound indium-antimony grown in a vertical Bridgman-Stockbarger fu rnace. Comparisons are made of interface velocities from five different com positions (40, 49, 50, 55, and 60 at.% Sb). Under specific growth condition s, the growth velocity for stoichiometric melts was comparatively constant and very close to the translation velocity. Measured chemical homogeneity w as excellent, though polycrystallinity could occur when concentration bound ary layers formed ahead of the interface. Off-stoichiometric melts exhibite d initial supercooling, resulting in transient interface velocities and pol ycrystallinity. The observed supercooling is governed by chemical segregati on in the melt. Thus, local growth velocity fluctuations are unambiguously attributed to a coupling of compositional effects in the melt and crystal f acetting kinetics.