Citation
Ca. Mack et G. Arthur, Notch model for photoresist dissolution, EL SOLID ST, 1(2), 1998, pp. 86-87
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHEMICAL AND SOLID STATE LETTERS
ISSN journal
10990062
→ ACNP
Volume
1
Issue
2
Year of publication
1998
Pages
86 - 87
Database
ISI
SICI code
1099-0062(199808)1:2<86:NMFPD>2.0.ZU;2-Q
Abstract
A new model for photoresist dissolution rate as a function of photoactive c
ompound concentration is presented. This semiempirical model combines eleme
nts of previous kinetic models in order to better fit recent experimental d
issolution rate behavior. In particular, rate data exhibiting a dissolution
notch can be well fit by this model. (C) 1998 The Electrochemical Society.
S1099-0062(97)10-117-1. All rights reserved.