Simulations of an electromigration-induced edge instability in single-crystal metal lines

Citation
M. Mahadevan et al., Simulations of an electromigration-induced edge instability in single-crystal metal lines, EUROPH LETT, 45(6), 1999, pp. 680-685
Citations number
26
Categorie Soggetti
Physics
Journal title
EUROPHYSICS LETTERS
ISSN journal
02955075 → ACNP
Volume
45
Issue
6
Year of publication
1999
Pages
680 - 685
Database
ISI
SICI code
0295-5075(19990315)45:6<680:SOAEEI>2.0.ZU;2-2
Abstract
We study the time evolution of a perturbation to the edge of an otherwise s traight, current-carrying, single-crystal metal line. If the applied curren t exceeds a critical value, the perturbation grows to become a slit-shaped void that spans the wire, and that leads to electrical failure. The slits i n our simulations are remarkably similar to those observed in experiments, and in some respects resemble viscous fingers in a Hele-Shaw cell.