Sw. Wan et al., Elastic moduli, strength, and fracture initiation at sharp notches in etched single crystal silicon microstructures, J APPL PHYS, 85(7), 1999, pp. 3519-3534
We designed and fabricated a series of micromechanical test structures for
microtensile testing by anisotropically etching epitaxial silicon. Specimen
s were fabricated to study Young's moduli, the uniaxial tensile strength, a
nd the strength of T-structures which are tensile bars with an abrupt reduc
ed cross section that have a 90 degrees corner at the point of reduction. T
hey are a generic mimic of actual transitions that occur in micromechanical
structures due to anisotropic etching. The test structures were loaded in
uniaxial tension in a piezoactuated microtensile test apparatus. The applie
d force and crosshead displacement were recorded and displacements in the s
pecimen gage section were directly measured using a speckle interferometry
technique. During tensile loading of the T-structures, fracture always init
iates at the sharp 90 degrees corners. This results in an interesting appar
ent strength scaling where the nominal strength of the structures increases
as their width decreases. In order to understand the fracture initiation f
rom the sharp 90 degrees corners of the silicon T-structures, we carried ou
t a complete analysis of the elastic fields at the 90 degrees corners by co
upling an asymptotic analysis (to compute the asymptotic radial and angular
dependence of the elastic fields up to an arbitrary constant for each load
ing mode, the stress intensity), and full-field finite element calculations
(to determine the magnitude of the stress intensities for specific geometr
ies and loadings). Excellent results are obtained by using a single paramet
er, the critical mode I stress intensity, to correlate fracture initiation
from the sharp 90 degrees corners of the T-structures. (C) 1999 American In
stitute of Physics. [S0021-8979(99)00306-0].