Energetics and vibrational frequencies of interstitial H-2 molecules in semiconductors

Citation
Cg. Van De Walle et Jp. Goss, Energetics and vibrational frequencies of interstitial H-2 molecules in semiconductors, MAT SCI E B, 58(1-2), 1999, pp. 17-23
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
58
Issue
1-2
Year of publication
1999
Pages
17 - 23
Database
ISI
SICI code
0921-5107(19990212)58:1-2<17:EAVFOI>2.0.ZU;2-E
Abstract
We report a comprehensive investigation of the incorporation of H-2 molecul es in semiconductors. We consider five different materials (Si, GaAs, InAs, GaP and GaN), and use a density-functional-pseudopotential approach. Combi ned with calculations for H-2 in vacuum, these results enable us to examine trends and develop an understanding of the physics of incorporation of a s trongly bound molecule in a semiconducting environment. We find that the vi brational frequency of the interstitial molecules is shifted down significa ntly compared to the free molecule. We also investigate anharmonicity in th e molecular vibrations. The results confirm a recent assignment of Raman li nes to interstitial H-2 in GaAs, but contradict an assignment claiming that the frequency for H-2 in Si is close to the free-molecule value. Finally, we calculate and discuss diffusion of H-2 molecules through a Si crystal. ( C) 1999 Elsevier Science S.A. All rights reserved.