Zygo interferometer for measuring refractive index of photorefractive bismuth silicon oxide (Bi12SiO20) crystal

Citation
Rp. Shukla et al., Zygo interferometer for measuring refractive index of photorefractive bismuth silicon oxide (Bi12SiO20) crystal, OPT LASER T, 30(6-7), 1998, pp. 425-430
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
OPTICS AND LASER TECHNOLOGY
ISSN journal
00303992 → ACNP
Volume
30
Issue
6-7
Year of publication
1998
Pages
425 - 430
Database
ISI
SICI code
0030-3992(199809/10)30:6-7<425:ZIFMRI>2.0.ZU;2-5
Abstract
An application of the Zygo system for measuring the refractive index of opt ical materials such as bismuth silicon oxide (BSO) having a higher value of the refractive index than that of glass is presented. The setting accuracy is found to be of the order of 1 mu m in the Zygo phase measuring interfer ometer. The mean value of refractive index of BSO crystal measured by the i nterferometer for several samples of thickness in the range of 3-9 mm is 2. 542 at a wavelength of 632.8 nm. The accuracy of measurement is +/-0.002. I t is possible to achieve an accuracy of +/-0.0003 for a sample of thickness of 30 mm in the measurement of refractive index due to high setting accura cy of the Zygo system. (C) 1999 Elsevier Science Ltd. All rights reserved.