Internal friction and relaxation mechanism of F-doped SiO2 glasses

Citation
H. Kobayashi et al., Internal friction and relaxation mechanism of F-doped SiO2 glasses, PHYSICA B, 263, 1999, pp. 346-349
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
263
Year of publication
1999
Pages
346 - 349
Database
ISI
SICI code
0921-4526(199903)263:<346:IFARMO>2.0.ZU;2-9
Abstract
The internal friction and the Young's moduli of pure SiO2, SiO2-4 mol% F an d -8 mol% F glasses were measured in the temperature range of 1.6-250 K. Th e temperature dependencies of the internal friction were not different exce pt for their peak values, which showed differences of a few percent at 35 K . In contrast, the Young's moduli of F-doped SiO2 glasses were 7.5% (-4 mol % F) and 15% (-8 mol% F) less than that of pure SiO2 glass, respectively. B oth temperature dependencies were analyzed on the basis of Debye relaxation by the distributed double-well potential model. (C) 1999 Elsevier Science B.V. All rights reserved.