Growth of YBa2Cu3O7 on silicon and LaAlO3 with MgO buffer layers

Citation
Rj. Kennedy et al., Growth of YBa2Cu3O7 on silicon and LaAlO3 with MgO buffer layers, PHYSICA C, 314(1-2), 1999, pp. 69-72
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA C
ISSN journal
09214534 → ACNP
Volume
314
Issue
1-2
Year of publication
1999
Pages
69 - 72
Database
ISI
SICI code
0921-4534(19990301)314:1-2<69:GOYOSA>2.0.ZU;2-L
Abstract
Thin films of YBa2Cu3O7 (YBCO) have been grown on MgO buffer layers on LaAl O3 and silicon substrates by laser ablation at substrate temperatures of 75 0 degrees C in a 250 mTorr oxygen atmosphere. The films grown on MgO/LaAlO3 are c-axis oriented and epitaxial, as shown by X-ray measurements. The fil ms grown on MgO/Si have mixed a-, b-, and c-axis orientation. For YBCO/MgO/ Si the presence of the MgO buffer layer cannot be detected by X-ray diffrac tion, suggesting a possible reaction between the Si and MgO at elevated tem peratures. Pole figures show the YBCO growth on Si to be epitaxial with a s ignificant in plane random component. Resistivity measurements indicate tha t the transition temperature of the YBCO/MgO/LaAlO3 is 87 K, while the tran sition temperature for YBCO/MgO/Si is lower, 85 K, probably due to the poor epitaxy of the film. (C) 1999 Published by Elsevier Science B.V. All right s reserved.