Ja. Martin-gago et al., Study of the electronic bonding of Cl-Si(100) by synchrotron radiation photoemission spectroscopy and many-body calculations, SURF SCI, 424(1), 1999, pp. 82-93
The electronic structure of chlorine chemisorbed on a Si(100)-(2 x 1) surfa
ce is investigated by means of synchrotron radiation photoemission spectros
copy and many-body calculations of the one-hole density of states in order
to study the effect of strong correlations in the adsorbate layer. The expe
rimental spectrum stands in close agreement with previous experimental work
. Three adsorption geometries were considered in the density of states (DOS
) calculations: (i) adsorption on both ends of symmetric Si dimers; (ii) ad
sorption on only the upper Si atoms of buckled dimers; and (iii) a combinat
ion of both. Although the energy of the DOS maxima was similar in the three
cases, and in almost quantitative agreement with the experimental peaks be
low the ionisation threshold (13 eV), their intensities and widths were str
ongly different. Only when structures (i) and (ii) are mixed in the ratio 1
-2.5, as suggested by electron-stimulated desorption experiments, does the
DOS strongly resemble the photoemission spectrum. These structural effects
are also evident in the Cl chemisorption on Si vicinal surfaces, and subseq
uent annealing of the chlorinated surface, which leads to similar electroni
c states but with different intensities. The evolution of the experimental
spectra with temperature suggests that weaker phases are desorbed, more bou
nd species remaining only at the step edges and, after annealing, at the te
rraces. (C) 1999 Elsevier Science B.V. All rights reserved.