Mc. Bartelt et Jw. Evans, Temperature dependence of kinetic roughening during metal(100) homoepitaxy: transition between 'mounding' and smooth growth, SURF SCI, 423(2-3), 1999, pp. 189-207
From simulations of a realistic lattice-gas model for metal(100) homoepitax
y, we analyze the temperature (T) dependence of the film roughness (or inte
rface width), of the effective roughening exponent, of the local step-densi
ty, and of the persistence of the Bragg intensity oscillations. By also ana
lyzing the dependence on T of the lateral mass currents of deposited atoms,
we reveal a kinetic phase transition from a regime of 'mounding' at higher
T, to a regime of 'reentrant' smooth growth at lower T. Application of the
se results for the cases of Ag, Fe, and Cu homoepitaxy is discussed. Finall
y, we also describe some features of the dynamics of deposited atoms that c
ould lead to the recovery of rough growth at very low T. (C) 1999 Elsevier
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