Correlation between silicon particles and modulated crossed magnetic fieldin silane plasmas

Citation
K. Tazoe et al., Correlation between silicon particles and modulated crossed magnetic fieldin silane plasmas, THIN SOL FI, 341(1-2), 1999, pp. 55-58
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
341
Issue
1-2
Year of publication
1999
Pages
55 - 58
Database
ISI
SICI code
0040-6090(19990312)341:1-2<55:CBSPAM>2.0.ZU;2-Y
Abstract
The influence of a modulated crossed magnetic field on silicon particles ha le been investigated by a laser light scattering method and a field emissio n scanning electron microscopy (FESEM) in SiH4(10%)/Ar plasmas. In the init ial stage of silane discharge, the fluctuation of discharge current due to the modulated crossed magnetic field being applied is drastically decreased , then the density of silicon particles removed from the discharge space is increased and the average radius of the removed silicon particles is kept smaller than 10 nm of the detecting limit of FESEM. It is suggested that th e small silicon particles in the stage of the initial growth are effectivel y removed from the discharge space and the fluctuation of discharge current is related to the nucleation and the growth of silicon particles. (C) 1999 Elsevier Science S.A. All rights reserved.