Phase transformation phenomena from alpha type to gamma type one of Fe2O3 thin film deposited by PECVD

Citation
Bj. Kim et al., Phase transformation phenomena from alpha type to gamma type one of Fe2O3 thin film deposited by PECVD, THIN SOL FI, 341(1-2), 1999, pp. 79-83
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
341
Issue
1-2
Year of publication
1999
Pages
79 - 83
Database
ISI
SICI code
0040-6090(19990312)341:1-2<79:PTPFAT>2.0.ZU;2-6
Abstract
Fe-O thin films were prepared on an Al2O3 substrate by a plasma-enhanced ch emical vapor deposition (PECVD) technique. The phase transformation of Fe-O thin films was mainly controlled by the substrate temperature and the redu ction-oxidation process. The as deposited alpha-Fe2O3 phase was most stable at a deposition temperature of around 120 degrees C. The Fe3O4 phase was o btained by the reduction process of cu Fe2O3 phase in a H-2 ambiance or in the deposition range from 150-350 degrees C. The Fe3O4 phase could be trans formed into a gamma-Fe2O3 phase under controlled oxidation conditions at 28 0-300 degrees C. The phase transformation phenomenon from Fe3O4 to gamma-Fe 2O3 suggests oxidation of the Fe2+ ions to Fe3+ in Fe3O4, Fe3O4 and gamma-F e3O4 phases had the same spinal structure and were coexisted. (C) 1999 Else vier Science S.A. All rights reserved.