Thermal stability of TiN/AlN superlattices

Citation
M. Setoyama et al., Thermal stability of TiN/AlN superlattices, THIN SOL FI, 341(1-2), 1999, pp. 126-131
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
341
Issue
1-2
Year of publication
1999
Pages
126 - 131
Database
ISI
SICI code
0040-6090(19990312)341:1-2<126:TSOTS>2.0.ZU;2-R
Abstract
In this paper, the thermal study of a TiN/AlN superlattice was reported. Th e thermal stability of a superlattice structure and a crystal structure of cubic AlN in a TiN/AlN superlattice were evaluated by using in situ high te mperature transmission electron microscopy (HTTEM), X-ray diffraction (XRD) measurements and TEM observations after an annealing treatment in a hydrog en atmosphere, and semi in situ high temperature X-ray diffraction (HTXRD) in a nitrogen atmosphere. It was confirmed that the superlattice structure remained up to 1473 K for a short time by HTTEM observation. HTXRD studies showed that the superlattice structure and c-AlN remained after 1273 K anne aling for 3.5 h. According to the change of low angle diffraction intensity of HTXRD, two kinds of diffusion processes may operate. One was short rang e diffusion that improved the superlattice structure from 1073-1233 K and t he other was long range diffusion that started at above 1233 K. (C) 1999 El sevier Science S.A. All rights reserved.