In this paper, the thermal study of a TiN/AlN superlattice was reported. Th
e thermal stability of a superlattice structure and a crystal structure of
cubic AlN in a TiN/AlN superlattice were evaluated by using in situ high te
mperature transmission electron microscopy (HTTEM), X-ray diffraction (XRD)
measurements and TEM observations after an annealing treatment in a hydrog
en atmosphere, and semi in situ high temperature X-ray diffraction (HTXRD)
in a nitrogen atmosphere. It was confirmed that the superlattice structure
remained up to 1473 K for a short time by HTTEM observation. HTXRD studies
showed that the superlattice structure and c-AlN remained after 1273 K anne
aling for 3.5 h. According to the change of low angle diffraction intensity
of HTXRD, two kinds of diffusion processes may operate. One was short rang
e diffusion that improved the superlattice structure from 1073-1233 K and t
he other was long range diffusion that started at above 1233 K. (C) 1999 El
sevier Science S.A. All rights reserved.