Preparation of thermosensitive magnetron sputtered thin films

Citation
G. Beensh-marchwicka et al., Preparation of thermosensitive magnetron sputtered thin films, VACUUM, 53(1-2), 1999, pp. 47-52
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
VACUUM
ISSN journal
0042207X → ACNP
Volume
53
Issue
1-2
Year of publication
1999
Pages
47 - 52
Database
ISI
SICI code
0042-207X(199905)53:1-2<47:POTMST>2.0.ZU;2-L
Abstract
The formation and properties of silicon, germanium, carbon and carbon-silic on magnetron sputtered thin films are described. The influence of various e lements (e.g. B, Au, Sb, V and Ta) on thermosensitive thin film properties have been studied. The dopants were introduced directly from a mosaic circu lar target surface with separated zones of individual components in radial symmetry. It has been found that the selection of appropriate material comp ositions and sputtering conditions allow adjustment of the film resistivity rho, the temperature coefficient of resistance TCR and Seebeck effect Q(th ). (C) 1999 Elsevier Science Ltd. All rights reserved.