Oxidation behaviour of TiAlN coatings sputtered at low temperature

The basic mechanical and structural properties, as well as the oxidation be haviour of Ti1-xAlxN coatings sputtered at low temperature are reported. Ti 1-xAlxN coatings of four different compositions were sputter deposited in a Sputron (Balzers) plasma-beam sputtering apparatus at a temperature below 200 degrees C. Polished tool steel discs, silicon wafers and polished alumi na ceramics were used as substrates. Oxidation of coatings was carried out by heating the samples at temperatures of 700-900 degrees C in an oxygen at mosphere for selected times. The surface and fracture cross-sectional morph ology of the as-deposited and oxidized films were studied by scanning elect ron microscopy, while the structure of the coatings was examined by the XRD and TEM techniques. (C) 1999 Elsevier Science Ltd. All rights reserved.