Characterization of an unbalanced magnetron for composite film (metal/C : H) deposition

In this paper, plasma parameters of a DC unbalanced planar magnetron applie d for Mo/C:H composite film deposition are described in connection with the basic film properties. Langmuir probe (of a V shape) heated to a dark red was used for V A characteristic measurements in Ar and in a mixture of Ar a nd n-hexane as working gases. Floating and plasma potentials, electron temp erature and concentrations were measured. Using a cold plane Langmuir elect rostatic probe in the form of a small disc the radial distribution of a pla sma potential and saturated ion current to the probe were determined. Using a thermocouple probe spot welded to the disc probe a heat load in the subs trate plane was investigated. Also the dependence of the floating potential on pressure of the working gas and substrate temperature on the power deli vered to the discharge were found. Finally, radial distribution of the comp osite film resistance per square and film thickness were measured and are d iscussed in connection with the measured plasma parameters. (C) 1999 Elsevi er Science Ltd. All rights reserved.