TOPOLOGICAL ANALYSIS OF THE ELECTRON-DENSITY DISTRIBUTION OF BIS(DIIMINOSUCCINONITRILO)NICKEL, NI(C4N4H2)(2) - COMPARISON BETWEEN EXPERIMENT AND THEORY
Ts. Hwang et Y. Wang, TOPOLOGICAL ANALYSIS OF THE ELECTRON-DENSITY DISTRIBUTION OF BIS(DIIMINOSUCCINONITRILO)NICKEL, NI(C4N4H2)(2) - COMPARISON BETWEEN EXPERIMENT AND THEORY, The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 102(21), 1998, pp. 3726-3731
A quantitative description of chemical bonds in bis(diiminosuccinonitr
ilo)nickel, Ni(disn)(2), is made in terms of topological properties of
electron densities. These properties are obtained both from an X-ray
diffraction experiment and from molecular orbital calculations. The as
phericity in electron density around the Ni ion is surely observable f
rom the Laplacian of the electron density with density accumulation in
the d(pi)direction but density depletion along the d sigma (Ni-N) dir
ection. On the basis of the topological properties at bond critical po
ints, the bonding between Ni and the imino nitrogen atom is classified
as mainly a closed-shell interaction but with some covalent character
. The bonds within the ligand, disn, are all shared interactions, and
the bond order is reflected clearly from the density at the critical p
oint, rho(r(c)), The pi-delocalization of the molecule is precisely in
dicated by the bond ellipticity and is illustrated by Fermi-hole distr
ibution. Atom domains in the molecule are demonstrated. Molecular elec
trostatic potential is derived both from experiment and from MO calcul
ations. For all the properties, the agreement between experiment and t
heory is reasonable.