N. Kuzuu et al., STRUCTURAL-CHANGE IN THE NEAR-SURFACE OF A SILICA GLASS BLOCK BY HEAT-TREATMENT, Nippon Seramikkusu Kyokai gakujutsu ronbunshi, 106(5), 1998, pp. 525-527
The effect of annealing on the distribution of OH content and defect s
tructures in a disk shaped block of fused silica containing approximat
ely 1500 ppm of OH was investigated. Heating at 1160 degrees C for 120
h reduced the OH content near surface by about 60 ppm, and absorption
bands at 6.5, 5.8, 5.0 and 4.8 eV were induced near the side surface.
The amount of the reduction of OH content near the top surface was ab
out 45 ppm, and only the 6.5-eV band was induced.