Xd. Bai et al., EFFECT OF SELF-ION BOMBARDMENT DAMAGE ON HIGH-TEMPERATURE OXIDATION BEHAVIOR OF ZIRCALOY-4, Journal of nuclear materials, 254(2-3), 1998, pp. 266-270
Citations number
21
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
In order to simulate the oxidation behavior of Zircaloy-4 in pressuriz
ed water reactors, it was bombarded with 190 keV Zr+ ions at liquid ni
trogen temperature up to a dose of 8 x 10(16) ions/cm(2) and was then
oxidized in pure oxygen at 923 K and 133.3 Pa. Auger electron spectros
copy (AES) and X-ray photoelectronic spectroscopy (XPS) were employed
to investigate the distribution and the valence of oxygen and zirconiu
m ions inside the oxide films before and after bombardment. It was fou
nd that: (1) the Zr+ ion bombardment enhanced the oxidation of Zircalo
y-4 and resulted in the oxidation weight gain at a dose of 8 x 10(16)
ions/cm(2) which was four times greater than that of the unbombarded s
ample; (2) the valence of zirconium ions in the oxide films was classi
fied as Zr-0, Zr1+, Zr2+, Zr3+ and Zr4+ and the higher valence of zirc
onium ions increased after the bombardment; (3) the irradiation oxidat
ion damage function was established and (4) a regression formula descr
ibing the relation between the oxidation weight gain and dpa (displace
ment per atom) was obtained. (C) 1998 Elsevier Science B.V.