CHARACTERISTICS OF THE PLANAR PLASMA SOURCE SUSTAINED BY MICROWAVE-POWER

This article presents a new configuration of large area planar plasma source whose plasma is sustained by microwave power without the presen ce of static magnetic fields. The absorbed power is Varied from 200 to 2000 W and the power absorption occurs over a large area plasma-quart z window interface. The performance of this plasma source is character ized by the plasma density and electron temperature measurements for t he argon discharge within the pressure range 5-200 mTorr. Within the i nvestigated pressure range the source provides a large volume diffusio n-controlled plasma with ionic densities above 10(12) cm(-3). The micr owave modes responsible for the plasma maintenance are also discussed.