The formation of circular cone-shaped Ge islands (12 degrees cones) ha
s been observed for the growth of eight monolayers of Ge on Si(001) at
700 degrees C using Sb as a surfactant. The Ge cones are strained and
grow pseudomorphically, adopting the Si lattice constant. They have a
tilt angle of 12 degrees and are composed of [117]-, [105]-type, and
all intermediate facets. The island-size distribution is peaked around
a typical size of similar to 300-400 Angstrom, which results from a f
ormation process under equilibrium conditions for diffusion of the Ge
atoms. Growth at lower temperatures down to 300 degrees C with Sb as a
surfactant results in epitaxial but very rough Ge films which show a
high degree of disorder.