CHEMICAL-VAPOR-DEPOSITED DIAMOND FOR THERMAL MANAGEMENT

Authors
Citation
Je. Graebner et S. Jin, CHEMICAL-VAPOR-DEPOSITED DIAMOND FOR THERMAL MANAGEMENT, JOM, 50(6), 1998, pp. 52-55
Citations number
35
Categorie Soggetti
Metallurgy & Metallurigical Engineering","Material Science",Mineralogy
Journal title
JOMACNP
ISSN journal
10474838
Volume
50
Issue
6
Year of publication
1998
Pages
52 - 55
Database
ISI
SICI code
1047-4838(1998)50:6<52:CDFTM>2.0.ZU;2-E
Abstract
The record-high thermal conductivity of high-quality diamond makes it a natural choice for many applications in thermal management. The colu mnar microstructure of chemical-vapor-deposited diamond thick films, h owever, causes anisotropy and a strong gradient in the conductivity, b oth of which can be understood in terms of phonon-scattering defects t hat aggregate near grain boundaries. Techniques to take maximum advant age of the high thermal conductivity include the removal of fine-grain ed low-conductivity material near the substrate surface and the provis ion of excellent thermal contact between the diamond and heat sources or sinks.