W-TI-O LAYERS FOR GAS-SENSING APPLICATIONS - STRUCTURE, MORPHOLOGY, AND ELECTRICAL-PROPERTIES

Citation
L. Sangaletti et al., W-TI-O LAYERS FOR GAS-SENSING APPLICATIONS - STRUCTURE, MORPHOLOGY, AND ELECTRICAL-PROPERTIES, Journal of materials research, 13(6), 1998, pp. 1568-1575
Citations number
18
Categorie Soggetti
Material Science
ISSN journal
08842914
Volume
13
Issue
6
Year of publication
1998
Pages
1568 - 1575
Database
ISI
SICI code
0884-2914(1998)13:6<1568:WLFGA->2.0.ZU;2-7
Abstract
The kinetics of phase transitions and phase segregation induced by ann ealing temperature on the Ti-W-O gas-sensing layer was studied by x-ra y diffraction, Raman spectroscopy, and scanning electron microscopy, T he main goal was to identify, on the basis of kinetics studies, struct urally stable Ti-WO3 thin film phases and compare their response to po lluting gases in order to determine possible correlations between stru ctural and electrical properties of the sensing layers.