MOLECULAR-STRUCTURE AND PHOTOCHEMICAL-REACTIONS OF TRIMETHYLSILYLMETHYL-SUBSTITUTED MASKED DISILENE

Authors
HOSHI T SHIMADA R KABUTO C SANJI T SAKURAI H
Citation
T. Hoshi et al., MOLECULAR-STRUCTURE AND PHOTOCHEMICAL-REACTIONS OF TRIMETHYLSILYLMETHYL-SUBSTITUTED MASKED DISILENE, Chemistry Letters, (5), 1998, pp. 427-428
Citations number
12
Categorie Soggetti
Chemistry
Journal title
Chemistry Letters → ACNP
ISSN journal
03667022
Issue
5
Year of publication
1998
Pages
427 - 428
Database
ISI
SICI code
0366-7022(1998):5<427:MAPOT>2.0.ZU;2-U
Abstract
(Trimethylsilylmethyl)trimethyldisilene was generated photochemically from 1-phenyl-7-trimethylsilylmethyl-7,8, 8-trimethyl-7, 8-disilabicyc lo[2.2.2]octa-2,5-diene (masked disilene). UV spectrum and regioselect ivity of the addition reaction of phenols to the disilene were discuss ed. The molecular structure of the masked disilene was also determined by single-crystal X-ray diffraction.