ION FLUX AND DEPOSITION RATE MEASUREMENTS IN THE RF CONTINUOUS-WAVE PLASMA POLYMERIZATION OF ACRYLIC-ACID

Authors
BECK AJ FRANCE RM LEESON AM SHORT RD GOODYEAR A BRAITHWAITE NS
Citation
Aj. Beck et al., ION FLUX AND DEPOSITION RATE MEASUREMENTS IN THE RF CONTINUOUS-WAVE PLASMA POLYMERIZATION OF ACRYLIC-ACID, Chemical communications, (11), 1998, pp. 1221-1222
Citations number
8
Categorie Soggetti
Chemistry
Journal title
Chemical communications → ACNP
ISSN journal
13597345
Issue
11
Year of publication
1998
Pages
1221 - 1222
Database
ISI
SICI code
1359-7345(1998):11<1221:IFADRM>2.0.ZU;2-V
Abstract
Ion flux and deposition rate measurements made in plasmas of acrylic a cid support the view that at low plasma power ions are primarily respo nsible for deposit growth.