MEASUREMENT OF SIH2 DENSITY IN A DISCHARGE BY INTRACAVITY LASER-ABSORPTION SPECTROSCOPY AND CW CAVITY RING-DOWN SPECTROSCOPY

Citation
A. Campargue et al., MEASUREMENT OF SIH2 DENSITY IN A DISCHARGE BY INTRACAVITY LASER-ABSORPTION SPECTROSCOPY AND CW CAVITY RING-DOWN SPECTROSCOPY, Journal of physics. D, Applied physics, 31(10), 1998, pp. 1168-1175
Citations number
42
Categorie Soggetti
Physics, Applied
ISSN journal
00223727
Volume
31
Issue
10
Year of publication
1998
Pages
1168 - 1175
Database
ISI
SICI code
0022-3727(1998)31:10<1168:MOSDIA>2.0.ZU;2-B
Abstract
Two highly sensitive and quantitative absorption techniques have been applied to the detection of SiH2 in an argon-5% silane DC discharge, t he new method of CW cavity ring-down spectroscopy (CWCRDS) and intraca vity laser absorption spectroscopy (ICLAS). Doppler-limited absorption lines of the (A) over tilde B-1(1)(020) <-- (X) over tilde (1)A(1)(00 0) transition around 580 nm could be observed. By using the rotational constants and the electronic transition moment available in the liter ature, we have calculated the line intensity of some specific rovibron ic transitions from which we deduced the concentration of SiH2 in the discharge to be about 10(10) cm(-3). Taking into account the signal-to -noise ratio, concentrations as small as a few times 10(8) cm(-3) can be detected by both methods. We also observed a weak broadband absorpt ion of several 10(-7) cm(-1) due to the dust particles formed in the p lasma volume, which for particles of 1 nm diameter would correspond to a few times 10(9) cm(-3). The performances of ICLAS and CWCRDS are co mpared.