Mg. Hackenberg et al., A PARALLEL MULTIGRID SOLVER APPLIED TO THE SIMULATION OF THERMAL-OXIDATION AND DIFFUSION-PROCESSES, Computational materials science, 11(2), 1998, pp. 105-108
The complexity of the future processing models and the need for three-
dimensional simulation require both efficient numerical methods and fa
st computers. In this paper, a general parallel PDE solver is presente
d, which has been adapted to the solution of so-called coupled problem
s. The numerical solution strategy exploits the optimal behavior of mu
ltigrid methods and the grid partitioning for an easy parallelization.
As the typical thermal processes in VLSI process simulation can be co
nsidered as a coupled problem, the program has been applied to this im
portant class of applications. The flow of the silicon dioxide is mode
led as viscous flow. The impurity diffusion takes oxidation enhancemen
t into account. (C) 1998 Elsevier Science B.V.