A PARALLEL MULTIGRID SOLVER APPLIED TO THE SIMULATION OF THERMAL-OXIDATION AND DIFFUSION-PROCESSES

Citation
Mg. Hackenberg et al., A PARALLEL MULTIGRID SOLVER APPLIED TO THE SIMULATION OF THERMAL-OXIDATION AND DIFFUSION-PROCESSES, Computational materials science, 11(2), 1998, pp. 105-108
Citations number
5
Categorie Soggetti
Material Science
ISSN journal
09270256
Volume
11
Issue
2
Year of publication
1998
Pages
105 - 108
Database
ISI
SICI code
0927-0256(1998)11:2<105:APMSAT>2.0.ZU;2-1
Abstract
The complexity of the future processing models and the need for three- dimensional simulation require both efficient numerical methods and fa st computers. In this paper, a general parallel PDE solver is presente d, which has been adapted to the solution of so-called coupled problem s. The numerical solution strategy exploits the optimal behavior of mu ltigrid methods and the grid partitioning for an easy parallelization. As the typical thermal processes in VLSI process simulation can be co nsidered as a coupled problem, the program has been applied to this im portant class of applications. The flow of the silicon dioxide is mode led as viscous flow. The impurity diffusion takes oxidation enhancemen t into account. (C) 1998 Elsevier Science B.V.