Fluorocarbon films were deposited on type 301 stainless steel substrat
es from mixtures of hexafluoroetbane (HFE) or hexafluoroacetone (HFA)
and acetylene and argon in a radio-frequency (13.56 MHz) plasma discha
rge. A 10 nm thick polysilicon interlayer was deposited prior to fluor
ocarbon film deposition to obtain good adhesion. To prevent film failu
re, a-C:H layer was deposited on the polysilicon layer prior to fluoro
carbon film deposition, resulting in a-C:H/fluorocarbon composite film
structures. The influence of the feed gas composition on the properti
es of the layered structure was investigated. Surface energies of the
films were calculated from the film contact angle values obtained with
water and diiodomethane. The composition of the surface layer of thes
e films was characterized using X-ray photoelectron spectroscopy (XPS)
. The resistance offered by these a-C:H/fluorocarbon film structures t
o anodic breakdown in an electrolyte containing 0.1 M NaCl and 0.1 M N
a2SO4 was studied using a potentiostatic technique. The anodic current
density for the coated type 301 stainless steel samples was at least
3 orders of magnitude smaller than that for the bare sample and more t
han an order of magnitude smaller than that observed with samples coat
ed with only the (equally thick) a-C:H layer. The resistance offered b
y the layered coatings to solution penetration increased with increasi
ng fluorine content in the films.