COMPARISION OF FIELD ELECTRON-EMISSION FROM DLC FILMS PRODUCED BY 4 DIFFERENT DEPOSITION TECHNIQUES

Citation
Av. Karabutov et al., COMPARISION OF FIELD ELECTRON-EMISSION FROM DLC FILMS PRODUCED BY 4 DIFFERENT DEPOSITION TECHNIQUES, DIAMOND AND RELATED MATERIALS, 7(6), 1998, pp. 802-806
Citations number
22
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
7
Issue
6
Year of publication
1998
Pages
802 - 806
Database
ISI
SICI code
0925-9635(1998)7:6<802:COFEFD>2.0.ZU;2-X
Abstract
Diamond-like carbon (DLC) films produced by ion beam, laser-arc, r.f.- plasma deposition and magnetron sputtering were characterized on the f ield electron emission properties (thresholds, hysteresis behaviour, s tability, homogeneity). The best samples showed electron emission at f ields of 4-20 V mu m(-1). Correlations between emission properties and film hardness. Raman spectra, optical band gap, sp(3)-bonded carbon c ontent and electroconductivity were found. A specially designed high v acuum scanning tunneling-field emission microscope was used for simult aneous mapping of film morphology, work function and local field emiss ion intensity. Correlations were observed between emission centres loc ation and work function minima. Factors that improve the field electro n emission from DLC films are discussed. (C) 1998 Elsevier Science S.A .