THE INFLUENCE OF SUBSTRATE-TEMPERATURE AND ANNEALING ON PHASE-FORMATION AND CRYSTALLINE PROPERTIES OF BISMUTH TITANATE FILM BY APMOCVD

Bismuth titanate thin films have been grown by the atmospheric pressur e metal-organic chemical vapour deposition technique. The influences o f substrate temperature and annealing on phase formation and crystalli ne properties have been studied. (100) oriented Bi4Ti3O12 films have b een grown at 550-degrees-C, while (001) preferred orientation films we re obtained at high temperature (about 800-degrees-C) annealing. At a temperature of 650-750-degrees-C, a film with Bi4Ti3O12+Bi2Ti2O7 phase s was formed. It is shown that the phase formation may depend upon the growth temperature and composition of film. The orientation of films mainly depended upon the lattice match with substrate.