A METHOD FOR THE DIFFRACTIVE MICRORELIEF FORMATION USING THE LAYERED PHOTORESIST GROWTH

Authors
VOLKOV AV KAZANSKIY NL MOISEYEV OJ SOIFER VA
Citation
Av. Volkov et al., A METHOD FOR THE DIFFRACTIVE MICRORELIEF FORMATION USING THE LAYERED PHOTORESIST GROWTH, Optics and lasers in engineering, 29(4-5), 1998, pp. 281-288
Citations number
10
Categorie Soggetti
Optics
Journal title
Optics and lasers in engineering → ACNP
ISSN journal
01438166
Volume
29
Issue
4-5
Year of publication
1998
Pages
281 - 288
Database
ISI
SICI code
0143-8166(1998)29:4-5<281:AMFTDM>2.0.ZU;2-4
Abstract
A technology of diffraction relief fabrication without substrate etchi ng is proposed. The step-wise relief is produced by the multiple apply ing of photoresist layers (layer over the layer). The layers are previ ously exposed to light through the appropriate photomasks and subject to all conventional stages of resist processing. (C) 1998 Elsevier Sci ence Ltd. All rights reserved.