O. Gruber et al., PHYSICAL CHARACTERIZATION OF ELECTRON TRAPPING IN UNIBOND(R) OXIDES, IEEE transactions on nuclear science, 45(3), 1998, pp. 1402-1406
In this work, we study the trapping properties of Unibond(R) oxides. W
e measure its radiative response under different irradiation condition
s using both point-contact and MOS transistors. The results obtained s
how both hole and electron trapping, as previously observed in SIMOX.
But in the Unibond(R) case, there is a positive shift of the threshold
voltage at very high doses. Using a simple model, we explain this shi
ft by considering a second type of electron traps.