The resistance of thin cobalt (Co) and niobium (Nb) films was monitore
d during their exposure to hydrogen or carbon monoxide for 1000 s, at
a fixed pressure, and also during the removal of the gas from the surf
ace. In an adsorption-desorption cycle the resistivity changed in a ''
saw-tooth'' fashion, similar to the changes observed in traditional gr
avimetric studies. The resistivity increase caused by the adsorbed gas
seems to be directly related to weakly adsorbed states and the roughn
ess of the film surface. The surface roughness decreases the magnitude
of the adsorption-driven resistivity change in such a way that rough-
thin Co films show a similar resistance change to that for smooth-thic
k Nb films. The roughness of the films depends on the deposition techn
ique used, and it was determined by low-angle X-ray diffraction and sc
anning tunneling microscopy.