HIGH-RATE DEPOSITION OF LINBO3 FILMS BY THERMAL PLASMA SPRAY CVD

LiNbO3 films were prepared by a thermal plasma spray chemical vapor de position method using liquid source material. Preferentially (110)-ori ented LiNbO3 films were obtained on sapphire (110) substrates with the deposition rate of 0.1 mu m/min, which was 10-100 times faster than t hose of other conventional vapor phase deposition methods. Moreover, l arge-area deposition over a 5-inch diameter could also be confirmed. T hese results demonstrate the effectiveness of this method for high-rat e, large-area deposition of LiNbO3 films. (C) 1998 Elsevier Science S. A.