STUDY OF NICKEL UPD AT A POLYCRYSTALLINE PT ELECTRODE AND ITS INFLUENCE ON HCOOH OXIDATION IN ACIDIC AND NEARLY NEUTRAL MEDIA

Authors
Citation
Aa. Elshafei, STUDY OF NICKEL UPD AT A POLYCRYSTALLINE PT ELECTRODE AND ITS INFLUENCE ON HCOOH OXIDATION IN ACIDIC AND NEARLY NEUTRAL MEDIA, Journal of electroanalytical chemistry [1992], 447(1-2), 1998, pp. 81-89
Citations number
58
Categorie Soggetti
Electrochemistry,"Chemistry Analytical
Journal title
Journal of electroanalytical chemistry [1992]
ISSN journal
15726657 → ACNP
Volume
447
Issue
1-2
Year of publication
1998
Pages
81 - 89
Database
ISI
SICI code
Abstract
The nickel underpotential deposition (upd) process at a Pt electrode w as studied using the cyclic voltammetric technique. In strong acidic m edium, Ni upd takes place in the hydrogen adsorption-desorption region . The maximum coverage was found to be approximate to 0.55 monolayer a t 10(-3) M Ni2+ ions in phosphate buffer (pH approximate to 6.85). The estimation of the electrosorption valence gave a value of ca. 2 with a replacement of one adsorbed hydrogen atom by each deposited Ni atom. The Ni upd coverage was found to depend on the surface structure of t he Pt electrode. The oxidation of HCOOH was inhibited by Ni upd and th e inhibition effect became more pronounced as the pH increased. (C) 19 98 Elsevier Science S.A. All rights reserved.