Ca. Wartenberg et Cr. Westgate, PULSED MICROWAVE S-PARAMETERS OF A SILICON-GERMANIUM HETEROJUNCTION BIPOLAR-TRANSISTOR, Microwave and optical technology letters, 18(4), 1998, pp. 258-264
This paper presents the first published S-parameters of an Si/Si1-xGex
/Si heterojunction bipolar transistor (HBT) measured under pulsed bias
/pulsed RF conditions. Comparison is made ro those of an Si bipolar ju
nction transistor (BJT) fabricated using the same mask set. Measuremen
ts made over a 400 mu s pulse show how device self-heating dramaticall
y affects the microwave-frequency response of the two devces. The resu
lts emphasize the need for accurate characterization of microwave Si d
evices in pulsed applications. (C) 1998 John Wiley & Sons, Inc.