Extended x-ray absorption fine structure performed at the Ge K edge ha
s found the Ge-Ge and Ge-Si bond lengths in a series of crystalline Ge
xSi1-x alloys (x less than or equal to 0.5) to be compositionally depe
ndent. This accurate measurement was made possible by utilizing the ex
perimentally derived Ge-Si atomic phase shift from the isoelectronic c
ompounds AlAs and Gap. Strain and Coulomb contributions to the bond le
ngths are also considered.