CATHODOLUMINESCENCE MEASUREMENT OF DIAMOND MIS STRUCTURE UTILIZING CAF2 FILM

Citation
H. Kawamura et al., CATHODOLUMINESCENCE MEASUREMENT OF DIAMOND MIS STRUCTURE UTILIZING CAF2 FILM, Diamond films and technology, 8(1), 1998, pp. 19-27
Citations number
7
Categorie Soggetti
Material Science","Materials Science, Coatings & Films
ISSN journal
09174540
Volume
8
Issue
1
Year of publication
1998
Pages
19 - 27
Database
ISI
SICI code
0917-4540(1998)8:1<19:CMODMS>2.0.ZU;2-6
Abstract
The surfaces of undoped CVD diamond films and natural diamond bulks we re investigated by cathodoluminescence (CL) measurement and compared w ith each other. Of particular importance in this work is treatment of the diamond surface by hydrogenation, oxidation and fluorination (CaF2 contact), with which the surface pinning level changed, giving rise t o a characteristic relationship between CL intensity and electron beam energy. The surface was found to be damaged (similar to 70 nm) by CVD plasma irradiation, due to which, emission at 520 nm (indication of p lasma damage) was obtained from CVD films. A meaningful but subtle cha nge was detected in the CL spectral shape and intensity at every stage of treatment.