GROWTH OF PHOSPHORUS-DOPED POLYCRYSTALLINE DIAMOND FILMS ADN THEIR APPLICATION TO FIELD EMITTERS

Citation
T. Sugino et al., GROWTH OF PHOSPHORUS-DOPED POLYCRYSTALLINE DIAMOND FILMS ADN THEIR APPLICATION TO FIELD EMITTERS, Diamond films and technology, 8(1), 1998, pp. 29-35
Citations number
12
Categorie Soggetti
Material Science","Materials Science, Coatings & Films
ISSN journal
09174540
Volume
8
Issue
1
Year of publication
1998
Pages
29 - 35
Database
ISI
SICI code
0917-4540(1998)8:1<29:GOPPDF>2.0.ZU;2-4
Abstract
Synthesis of diamond films doped with phosphorus (P) impurities has be en carried out by a hot-filament chemical vapor deposition method usin g CH3OH and H-2 as the source gas mixture. P2O5 is dissolved in CH3OH and transported with H-2 into a reaction chamber. Current-voltage char acteristics are obtained at various temperatures for P-doped diamond f ilms. The activation energy of the conductivity is estimated to be 0.4 9 eV from the Arrhenius plot. Electron emission is observed for the P- doped diamond film. The threshold electric field is estimated to be 14 V/mu m. Emission current as high as 10 mu A is obtained.