FTIR REFLECTION-ABSORPTION SPECTROSCOPY FOR ORGANIC THIN-FILM ON ITO SUBSTRATE

Authors
TAMADA M KOSHIKAWA H HOSOI F SUWA T
Citation
M. Tamada et al., FTIR REFLECTION-ABSORPTION SPECTROSCOPY FOR ORGANIC THIN-FILM ON ITO SUBSTRATE, Thin solid films, 315(1-2), 1998, pp. 40-43
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
315
Issue
1-2
Year of publication
1998
Pages
40 - 43
Database
ISI
SICI code
0040-6090(1998)315:1-2<40:FRSFOT>2.0.ZU;2-X
Abstract
Dielectric constant of indium-tin oxide (ITO) substrate was obtained b y the basis of free electron model to evaluate the reflection infrared (IR) spectrum of an organic chin film on the ITO substrate in the wav enumber region from 3500 to 600 cm(-1). In a wavenumber region of less than 2000 cm(-1), the given spectrum was approximate to the spectrum on a metal substrate having high reflectivity. In this region. the thi ckness of the PVCz thin film under physical Vapor deposition process w as proportional to the peal, intensity of reflection spectrum. (C) 199 8 Elsevier Science S.A.