Le. Rumaner et al., INTERACTION OF GASE WITH GAAS(111) - FORMATION OF HETEROSTRUCTURES WITH LARGE LATTICE MISMATCH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 977-988
We have studied the epitaxial growth of GaSe, a layered van der Waals
material, on GaAs, a zinc-blende-structure semiconductor. This heteros
tructure exhibits a 6% lattice mismatch, and is a prototypical example
of van der Waals epitaxy, where the weak van der Waals interaction al
lows the misfit to be accommodated without the formation of electronic
ally active defects. GaSe was supplied to the growing surface from a s
ingle GaSe Knudsen cell. Reflection high energy electron diffraction a
nd x-ray photoemission spectroscopy studies of the nucleation of GaSe
indicate Se reacts with the GaAs surface to remove the surface danglin
g bonds prior to GaSe formation. This is followed by the oriented grow
th of stoichiometric GaSe layers, that are rotationally aligned with t
he underlying GaAs substrate. The termination of the GaAs dangling bon
ds most likely occurs by Se substitution for As in the surface layer o
f GaAs(lll) B and by direct bonding of Se to surface Ga on GaAs(lll) A
surfaces. In addition, photoemission measurements indicate that the s
ubsurface Se uptake into the GaAs(lll) A lattice is higher than that i
n the (111) B lattice. (C) 1998 American Vacuum Society.