STRUCTURAL-PROPERTIES OF ELECTRODEPOSITED CO CU MULTILAYERS/

Co/Cu multilayers have been grown by electrodeposition using a potenti ostatic technique in a single electrolyte bath based on CoSO4, H3BO3 a nd CuSO4. X-ray diffraction performed on these multilayers have shown polycrystalline fee structure of both Co and Cu layers with preferenti al (111) texture. Nuclear magnetic resonance spectrum has been recorde d at 4.2 K on [Co(6 nm)/Cu(4 nm)](25) and has shown a resonance line a t 216 MHz which confirms the fee structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfac es are of good quality. A cross-sectional on transmission electron mic rograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) eff ect of about 4% at room temperature. (C) 1998 Elsevier Science S.A.